TSMC is expecting to receive its first state-of-the-art High-NA EUV lithography machine from TSMC this month, will begin ...

New York faces considerable competition from other states in its quest to land the National Semiconductor Technology Center, ...

TSMC was ahead of Intel with the adoption of EUV lithography tools for mass production, but when it comes to High-NA EUV ...

ASML's new TwinScan EXE:5000 High-NA EUV lithography machines cost approximately $380 million USD per machine, but TSMC will have no problems ponying up the cash as it is swimming in it with its ...

ASML’s latest high-numerical-aperture (NA) EUV lithography system, the Twinscan EXE:5000, can achieve a critical dimension (CD) of 8 nm. This means customers can print transistors 1.7× smaller—and ...