TWINSCAN EXE:5000 - EUV lithography systems - ASML
WEBThe TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. Its 8 nm resolution will enable chipmakers to print with a single exposure features 1.7 times smaller – and therefore achieve transistor densities 2.9 times higher – than those possible using TWINSCAN NXE systems.
EUV lithography systems – Products - ASML
WEBtwinscan exe:5000 The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will provide 8 nm resolution to support advanced Logic and Memory chip production.
5 things you should know about High NA EUV lithography - ASML
WEBJan 25, 2024 · After a decade of R&D, ASML shipped the first modules of the first High NA EUV lithography system to Intel in December 2023. The TWINSCAN EXE:5000 represents a significant step forward for cutting-edge chip manufacturing.
ASML Shows Off Next-Generation, $380 Million High-NA EUV …
WEBFeb 14, 2024 · The company's newest lithography tool weighs a staggering 165 tons and will cost up to $380 million, roughly double the price of its previous low-NA EUV lithography machines. ASML invited the...
Intel shares biggest unboxing video ever as ASML’s $380 million …
WEBMar 4, 2024 · Intel will use its Twinscan EXE:5000 lithography tool mainly to learn how to use High-NA EUV technology.
With High NA EUV, Intel Foundry Opens New Frontier in …
WEBApr 18, 2024 · Intel’s TWINSCAN EXE:5000 High NA EUV tool from lithography leader ASML is now going through calibration steps in preparation for production of Intel’s future process roadmap.
This Machine Could Keep Moore’s Law on Track - IEEE Spectrum
WEBJul 29, 2023 · The first high-NA EUV system, the ASML EXE:5000, will be installed in a new lab that we’re opening jointly with the Belgium-based nanoelectronics research facility Imec, in early 2024.
Intel receives first High-NA EUV chipmaking tool from ASML — …
WEBJan 5, 2024 · Intel will start installing the Twinscan EXE:5000 machine that can process 150 wafers per hour (at a dose of 30mJ/cm^2) with a <1.1nm matched-machine overlay performance.
ASML ships groundbreaking new chipmaking tool to Intel — High …
WEBDec 21, 2023 · The High-NA EUV tool that ASML ships is pilot Twinscan EXE:5000 machine which Intel acquired in 2018.
ASML's First High-NA EUV Litho Scanner Arrives At Intel [UPDATED]
WEBJan 5, 2024 · The Twinscan EXE:5000 extreme ultraviolet (EUV) scanner is AMSL's very first High-NA scanner, and it has eagerly been awaited by Intel, who first placed an order for the machine back in 2018.